K-Patents at SEMICON West

Moscone Center, San Francisco, California July 15-17, 2008

Presenting new K-Patents' technology for fab chemicals: K-Patents introduces the Semicon Refractometer PR-33-S.

The PR-33-S is a new addition to the K-patents refractometers for monitoring and measuring the liquid chemical concentrations throughout the whole semiconductor fabrication process, i.e. from chemical supplies down to fab in-line and tool in-situ chemical quality control.

The new PR-33-S is specifically designed for the ultra-clean environments and integrated process tools.

The PR-33-S monitors real-time the chemical concentrations and provides an Ethernet output signal and gives immediate feedback if the monitored chemical is not within the specifications. The concentration is deterrmined by making an optical measurement of the solution's refractive index. The advantage of this principle is that the same instrumebnt can be used to measure any chemical.

The PR-33-S consists of an ultra-pure PTFE (Teflon) sensor and an Ethernet connection, providing thus connectors and cabling that any standard PoE switch can use for transmitting power to the sensor and data to a computer.

The average payback time for this refractometer is 3-6 months.

The PR-33-S technical features:

  • Full range nD=1.3200...1.5300 (corresponds to 0-100% b.w.). For HF the range is nD=1.2600...1.50000.
  • Process temperature range -20(-4°F)...80°C (175°F).
  • Platinum Pt1000 temperature sensor
  • Fully automatic temperature compensation.
  • Factory calibrated for the user's chemical (based on an extensive library of chemical curves including temperature compensation).
  • Instruments are interchangeable: one PR-33-S can be replaced with another one without any recalibration.

Typical uses for the K-patents Semicon Refractometer:

  • Preventing wrong chemicals or wrong concentrations from entering the fabrication process.
  • Optimizing the etch process and increasing the bath life of the etch solution (e.g. heated KOH).
  • Increasing wafer throughput typically by +25% and reducing cleaning chemical consumption (e.g. SC-1 or EKC-265) in FEOL and BEOL cleaning.
  • Achieving tight control of CMP slurries and better uniformity of the planarization process.


Visit the K-Patents Booth at South Hall #3025 and pick up our teddy bear gift!