All News: Recent and Archived News and Press Releases

International Sugar Journal (ISJ) Article

December 9, 2011

The latest ISJ December issue features an article by Dr. Lajos Rozsa about on-line monitoring and control of supersaturation and other massecuite parameters in sugar vacuum pans. The article reviews on common practice to control crystallization in vacuum pans and presents new solutions and devices for the on-line monitoring of supersaturation based on the data which are needed for its exact calculation.

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Launching New Device: K-Patents Field Communicator

November 25, 2011

K-Patents introduces a new device, the Field Communicator FC-11 that can be used for controlling K-Patents process instruments remotely. Communicator allows you to access measurement data, diagnostic functions, and trend views via Ethernet connection and it is a perfect solution when you need to configure, update or verify your refractometer in the field environment.

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An article in the TAPPI Journal

October 17, 2011

An article about &Optimization of wash water usage in brown stock washing& was published in the TAPPI Journal in September, 2011. The article discusses about the use of refractometer measurements and advanced process data analysis tools to determine optimum level of wash water usage.

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Peer Reviewed Article in the Appita Magazine

October 13, 2011

Peer Reviewed article &Optimisation of pressure filter performance using refractometer measurements - Mill investigations& was published in the Appita Magazine Vol.64 No1. Real-time displacement ratio values where calculated using refractometer data and the washer performance was optimised. The results show that changes in the concentration of incoming flows to the washer can be detected on-line with real-time refractometer measurements.

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Meet us at the Semicon West, South Hall, Booth #1940!

June 30, 2011

K-Patents will introduce a third Generation Semicon Refractometer PR-33-S at the Semicon West show. The PR-33-S refractometer monitors and measures the liquid chemical concentrations throughout the whole semiconductor fabrication process, i.e. from chemical supplies down to fab in-line and tool in-situ chemical quality control.

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